top of page

Pushing the resolution limits: 200nm features and true 400 nm pitch gratings.

  • Rob Munday
  • Jul 25
  • 1 min read

Raith Laser Systems has demonstrated how the capabilities of the PicoMaster system can be extended to bridge the gap between light-based lithography and electron-beam lithography, enabling smaller features and greater accuracy, thus expanding the range of optical security features that a PicoMaster-H system can offer.


A 400nm pitch diffraction grating written using a PicoMaster 200 system
A 400nm pitch diffraction grating written using a PicoMaster 200 system

 
 
 

Comments


Copyright Spatial Imaging 2025 - All rights reserved

bottom of page