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PicoSDC-200, PicoSDC-250, PicoSD-200 and PicoSD-250
A computer-automated system for the manufacture of photoresist plates and the subsequent development, washing and drying of exposed plates. The PicoSDC ensures high-quality and consistent results every time.
The PicoSDC is an automated photoresist spin coating system with temperature controlled hot plate. The PicoSDC can also be used for the development, washing, and drying of exposed plates.
The PicoSD is a stand-alone automated photoresist plate developing, washing, and drying station.
Both modules support recipe-based programs with freely programmable processes.
Both modules are contained within an environmental, dust-free, HEPA filtered enclosure with laminar air flow.
Two sizes are available, the -200 for all sizes up to 200mm and the -250 for all sizes up to 250mm plates.
Photoresist spin coater and baking station - capabilities
Vacuum chuck
Up to 2000 RPM
Dispense arm for 2 types of photoresist
2 containers for photoresist storage.
Programmable temperature-controlled hot plate
Programmable timer
Maximum 120 degrees C
Exhaust
Laminar air flow with HEPA filter
Dual voltage - 110-230v, 50/60Hz 1.5 kW
Photoresist developing, washing, and drying station - capabilities
Vacuum chuck-Up to 2000 RPM
Dispense arm for water, developer, and adhesive (Silane)
Brush arm for mechanical cleaning, including water connection
Developer and adhesive containers for chemical storage
Waste can be connected to a city drain line or external storage
Laminar air flow with HEPA filter
Dual voltage - 110-230v, 50/60Hz 1.5 kW
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