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PicoSDC-200, PicoSDC-250, PicoSD-200 and PicoSD-250

A computer-automated system for the manufacture of photoresist plates and the subsequent development, washing and drying of exposed plates. The PicoSDC ensures high-quality and consistent results every time.

The PicoSDC is an automated photoresist spin coating system with temperature controlled hot plate. The PicoSDC can also be used for the development, washing, and drying of exposed plates.

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The PicoSD is a stand-alone automated photoresist plate developing, washing, and drying station.

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Both modules support recipe-based programs with freely programmable processes. 

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Both modules are contained within an environmental, dust-free, HEPA filtered enclosure with laminar air flow. 

 

Two sizes are available, the -200 for all sizes up to 200mm and the -250 for all sizes up to 250mm plates.

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PicoSDC-250 photoresist spin coater
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Hot Plate.jpg
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Photoresist spin coater and baking station - capabilities

Vacuum chuck

Up to 2000 RPM

Dispense arm for 2 types of photoresist

2 containers for photoresist storage.

Programmable temperature-controlled hot plate

Programmable timer

Maximum 120 degrees C

Exhaust

Laminar air flow with HEPA filter

Dual voltage - 110-230v, 50/60Hz 1.5 kW



Photoresist developing, washing, and drying station - capabilities
 
Vacuum chuck-Up to 2000 RPM
 
Dispense arm for water, developer, and adhesive (Silane)

Brush arm for mechanical cleaning, including water connection
 
Developer and adhesive containers for chemical storage
 
Waste can be connected to a city drain line or external storage

Laminar air flow with HEPA filter

Dual voltage - 110-230v, 50/60Hz 1.5 k
W

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